physical sputtering

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• physical sputtering — fizikinis dulkinimas statusas T sritis radioelektronika atitikmenys: angl. physical sputtering vok. physikalisches Sputtern, n rus. физическое распыление, n pranc. pulvérisation physique, f …   Radioelektronikos terminų žodynas

• Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… …   Wikipedia

• Physical vapor deposition — (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces (e.g., onto semiconductor wafers). The… …   Wikipedia

• Sputtering —   A process used to apply photovoltaic semi conductor material to a substrate by a physical vapor deposition process where high energy ions are used to bombard elemental sources of semiconductor material, which eject vapors of atoms that are then …   Energy terms

• High Power Impulse Magnetron Sputtering — (HIPIMS, also known as High Impact Power Magnetron Sputtering and High Power Pulsed Magnetron Sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely… …   Wikipedia

• Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… …   Wikipedia

• Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… …   Wikipedia

• Medard W. Welch Award — The award is given to scientists who demonstrated outstanding research in the fields pertinent to American Vacuum Society. It was established in 1969 in memory of Memory of Medard W. Welch, a founder of American Vacuum Society. The prestige of… …   Wikipedia

• Sputter cleaning — is the cleaning of a solid surface in a vacuum by using physical sputtering of the surface. Sputter cleaning is often used in vacuum deposition and ion plating. In 1955 Farnsworth, Schlier, George, and Burger reported using sputter cleaning in an …   Wikipedia

• Магнетронное распыление — Магнетронное распыление  это технология нанесения тонких плёнок на подложку с помощью магнетрона. Основы технологии Принцип магнетронного распыления основан на образовании над поверхностью катода кольцеобразной плазмы в результате… …   Википедия

• fizikinis dulkinimas — statusas T sritis radioelektronika atitikmenys: angl. physical sputtering vok. physikalisches Sputtern, n rus. физическое распыление, n pranc. pulvérisation physique, f …   Radioelektronikos terminų žodynas